EBL high voltage power supply

INTRODUCTION

Wisman’s EBL high voltage power supply is designed for precision electron beam applications, such as semiconductor nanolithography, micro optics and development mask work. It has ultra-low ripple and excellent stability specifications, which is very suitable for application which has very strict demanding. Provide selectable low output current and high output current range.

The high-voltage part of the solid encapsulation eliminates any user maintenance issues while isolating the components from environmental variables. The device is fully overload, arc and short circuit protection. Provide remote control programming and monitoring functions. Allows accurate passive measurement of high voltage output. Optional USB2.0, network port, RS-232, RS485 digital communication, can be customized according to user requirements.

TYPICAL APPLICATION

Micro optics
Semiconductor lithography
Semiconductor Exposure Machine
Mask

SPECIFICATION

Input voltage:
220Vac, ±10%, single-phase 50/60 Hz
The output voltage:
0 to 100kV, negative polarity. External switch can choose 105kV, ±500V
Output current: 0-10μA, low range, 0-100μA, high range
Switch optional
Voltage regulation :±0.001% of the rated voltage within the specified input voltage range

Load regulation:
≤20V, current changes from 25μA to 60μA and 60μA to 25μA
ripple: Peak-to-peak value≤70mV
High voltage micro discharge: Less than 200mV
stability: After 6 hours of preheating, 0.001% every 8 hours, the temperature is 20℃±0.2℃
Temperature Coefficient:25ppm per degree Celsius in the range of 10°C to 40°C
Environmental:
Operating temperature: 0 to 40 degrees Celsius
Storage temperature: -40 to 85 degrees Celsius
Humidity: 10 to 90% RH, no condensation
Cooling: Convection cooling
Front panel:
Power on/off switch
HV ON / OFF switch
HV ON/OFF indicator
Analog output voltmeter
Dimensions: 10.25HX 19 WX 27 D (26.7cm X 48.3cm X 55.9 cm)
weight: 116 lbs (50 kg)